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Sybilla 150 CBVD equipment development

[1]         E. Wagner, et Al.; C. S. Sandu, S. Harada, G. Benvenuti, V. Savu, and P. Muralt. Fabrication of complex oxide microstructures by combinatorial chemical beam vapour deposition through stencil masks. Thin Solid Films, 586:64–69, 2015.

[2]          E. Wagner, C. Sandu, S. Harada, and G. Benvenuti. Geometry of Chemical Beam Vapor Deposition System for Efficient Combinatorial Investigations of Thin Oxide Films: Deposited Film Properties versus Precursor Flow Simulations, ACS Comb. Sci., 2016, 18 (3), pp 154–161.

[3]          G. Benvenuti, E. Halary-Wagner, A. Brioude, and P. Hoffmann. High uniformity deposition with chemical beams in high vacuum. Thin Solid Films, 427(1-2):411–416, 2003.

[4]          G. Benvenuti. Chemical Beam Deposition of Titanium Dioxide Thin Films, n°2744. PhD thesis, Ecole Polytechnique Fédérale de Lausanne, 2003.

Combinatorial deposition study with Sybilla 150 CBVD equipment

[5]          A. Dabirian. Combinatorial High-Vacuum Chemical vapor Deposition of Lithium Niobate Thin Films. PhD Thesis, Ecole Polytechnique de Lausanne (EPFL), Switzerland, 2010.

[6]          A. Dabirian, S. Harada, Y. Kuzminykh, C. S. Sandu, E. Wagner, G. Benvenuti, P. Brodard, S. Rushworth, P. Muralt, and P. Hoffmann. Combinatorial chemical vapor deposition of lithium niobate thin films. ECS Transaction, 25(8):1221, 2009.

[7]          A. Dabirian, S. Harada, Y. Kuzminykh, C. S. Sandu, E. Wagner, G. Benvenuti, P. Brodard, S. Rushworth, P. Muralt, and P. Hoffmann. Combinatorial chemical beam epitaxy of lithium niobate thin films on sapphire. Journal of the Electrochemical Society, 158(2):D72–D76, 2011.

[8]          A. Dabirian, Y. Kuzminykh, B. Afra, S. Harada, E. Wagner, C. S. Sandu, G. Benvenuti, S. Rushworth, P. Muralt, and P. Hoffmann. Combinatorial discovery and optimization of amorphous HfO2-Nb2O5 mixture with improved transparency. Electrochemical and Solid State Letters, 13(7):G60–G63, 2010.

[9]          A. Dabirian, Y. Kuzminykh, S. Harada, C. Parsons, C. S. Sandu, E. Wagner, G. Benvenuti, S. Rushworth, P. Muralt, and P. Hoffmann. Efficient optimization of high vacuum chemical vapor deposition of niobium oxide on full wafer scale. IOP Conf. Series: Materials Science and Engineering Fundamentals and Technology of Multifuctional Oxide Thin Films (symposium G, EMRS 2009 Spring Meeting), 8:012026, 2010.

[10]        A. Dabirian, Y. Kuzminykh,  C. S. Sandu, S. Harada, E. Wagner, P. Brodard, G. Benvenuti, S. Rushworth, P. Muralt, and P. Hoffmann. Combinatorial high-vacuum chemical vapor deposition of textured hafnium-doped lithium niobate thin films on sapphire. Crystal Growth & Design, 11(1):203–209, 2011.

[11]        A. Dabirian, Y. Kuzminykh, E. Wagner, G. Benvenuti, S. A. Rushworth, and P. Hoffmann. Chemical vapor deposition kinetics and localized growth regimes in combinatorial experiments. Chemphyschem, 12(18):3524–3528, 2011.

[12]        A. Dabirian, Y. Kuzminykh, E. Wagner, G. Benvenuti, S. Rushworth, and P. Hoffmann. Evaluation of niobium dimethylamino-ethoxide for chemical vapour deposition of niobium oxide thin films. Thin Solid Films, 571:94–101, 2014.

[13]        G. Benvenuti, C. S. Sandu, and E. Wagner. TiO2 laser and electron beam assisted chemical deposition. IOP Conf. Series: Materials Science and Engineering, 8:012006, 2010.

[14]        M. Jobin, S. Jotterand, C. Pellodi, S. dos Santos, C. S. Sandu, E. Wagner, and G. Benvenuti. Full wafer metrology for chemically graded thin films. Proceedings of SPIE, Optical Micro- and Nanometrology IV, 8430:843009, 2012.

Patents

[15]        G. Benvenuti, E. Wagner, C. Sandu. Deposition Process Based on Stencil Mask and Application to the Fabrication of Tags Supporting Multi-Functional Traceable Codes. Patent:WO2015/140731A1, Sept. 2015. Applicant: 3D-Oxides S.A.S (F).

[16]        G. Benvenuti, E. Halary-Wagner, and C. Petit. Vapor Phase Deposition System. Patent EP2347030 A1, Dec 2009. Applicant: ABCD Technology S.A. (CH).

[17]        G. Benvenuti, E. Halary-Wagner, S. Amorosi, and P. Hoffmann. Large Area Deposition in High Vacuum with High Thickness Uniformity. Patent EP1504136, Nov 2003. Applicant: Ecole Polytechnique Fédérale de Lausanne (CH).

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