French SME incorporated in 2009, with the status of S.A.S.
Research lab in the Technoparc of Saint-Genis-Pouilly, close to Geneva.
3D-Oxides vision and purpose is to develop disruptive technologies in a wide range of fields such as integrated optics, photonics, micro and nanoelectronics, cleantechs or biotechs. The multi-disciplinary company staff displays several PhD in various fields of expertise to efficiently address top level R&D objectives. The company is involved in several steps of the production chain for thin film growth starting from chemical precursor synthesis to process development for CBVD (Chemical Beam Vapour Deposition) systems, to material science engineering up to first concepts in devices development.
Exploitation of the results are either transferred to our customers under the form of patent licenses or technology transfer services or in some cases injected into spin-off resulting from joint ventures with our R&D partners.