3D-Oxides provides a
wide range of coated substrates with single and multi-element oxide
thin films. We can also provide multi-layers of different materials. We can provide uniform coatings on up to 6" (150 mm) wafers or with controlled gradients in thickness for single element coatings.
TiO2 (Titanium dioxide or titania)
Ta2O5 (Tantalum pentoxide)
Nb2O5 (Niobium pentoxide)
We can provide on demand characterizations of single wafer with certifications including:
Thickness distribution for single element coatings
Crystalline phase characterization
We are able to provide a wide range of services in technology intelligence for material science and thin film deposition techniques.
Vapour pressure measurements in static and in dynamic regimes with different controlled effusion conditions. We can also calculate sticking coefficients with Monte-Carlo modeling.
We can develop new thin materials with customers tailored composition with up to 3 elements, uniformly on up to 6" wafers, or with gradients in thickness or chemical composition (Combinatorial facility) to speed-up properties optimization for a given application.
The products are only available at the moment within R&D collaborations and not as commercial products.